Buffer system for a wafer handling system
AssigneeNova Measuring Instruments Ltd.
InventorEran Dvir
Life of this patent
Estimating the term…
Abstract
An apparatus is provided for supporting semiconductor wafer in a wafer processing system. The apparatus comprises at least two wafer support assemblies, defining respectively at least two wafer support levels and being mounted between opposing support beams; one or more supporting bases connected to or integral with each of the wafer support assemblies; and a motion unit coupled to the support beams.
Claims28
1-15. (canceled)
An integrated measuring station for a semiconductor wafer comprising:
- a measuring unit;
- a wafer handling system;
- a buffer station comprising upper and lower supporting elements associated with said wafer handling system for receiving a wafer to be measured from an outer robot and a measured wafer from said handling system thereby to enable said robot to arrive at and leave said integrated measuring station with at least one wafer thereon.
The integrated measuring station according to claim 1 wherein said upper and lower supporting elements comprise at least one pair of supporting bases.
The integrated measuring station according to claim 1 further including a pre-alignment unit.
The integrated measuring station according to claim 1 wherein said at least one of said supporting elements are adapted to provide centering of said wafer to be measured.
The integrated measuring station according to claim 1 wherein said measuring unit is located below said buffer station and said wafer handling system.
The integrated measuring station according to claim 1 wherein said measuring unit is located above said buffer station and said wafer handling system.
The integrated measuring station according to claim 1 wherein said wafer handling system is movable along Z-axis.
The integrated measuring station according to claim 1 wherein said wafer handling system provides rotation of the wafer.
The integrated measuring station according to claim 1 wherein said wafer handling system provides a vacuum based holding.
The integrated measuring station according to claim 1 wherein at least one of said upper and lower supporting elements are movable horizontally.
The integrated measuring station according to claim 1 configured to be integrated with a semiconductor wafer processing tool selected from the group consisting of chemical-mechanical polisher, photo-track, exposure tool, etching equipment, physical vapor deposition tool and chemical vapor deposition tool.
Dependencies are inferred from the claim text.