Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorRobrecht De Weerdt
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Abstract
A lithographic apparatus having a positioning device that facilitates the maintenance of a conditioned environment, is presented. Embodiments of the invention include a combination of a first drive unit and a second drive unit for positioning an object table in a lithographic apparatus. The first drive unit has a first part connected to the object table and a second part connected to a first part of the second drive unit. First and second part of the first drive unit are separated from each other by a wall. Maintaining a conditioned environment surrounding the object is thereby facilitated.
Claims21
A lithographic apparatus comprising:
- an illumination system configured to condition a beam of radiation;
- a patterning device holder configured to hold a patterning device, the patterning device serving to impart the beam of radiation with a pattern in its cross-section;
- a substrate holder configured to hold a substrate;
- a projection system configured to project the patterned beam of radiation onto a target portion of the substrate;
- and
- a positioning device configured to position at least one of said holders, said positioning device comprising:
- a first drive unit comprising a first part and a second part, the first part being connected to the holder to be positioned, said first part movable relative to the second part;
- and
- a second drive unit configured to displace said first drive unit in at least one direction, the second part of the first drive unit being connected to said second drive unit,
- wherein the second drive unit and the second part of the first drive unit are separated from the first part of the first drive unit by a wall.
A positioning device for positioning an object table, comprising:
- a first drive unit comprising a first part and a second part, the first part being connected to said object table and movable relative to the second part;
- and
- a second drive unit configured to displace said first drive unit in at least one direction, the second part of the first drive unit being connected to said second drive unit,
- wherein the second drive unit and the second part of the first drive unit are separated from the first part of the first drive unit by a wall.
A device manufacturing method comprising:
- providing a beam of radiation;
- patterning the beam of radiation with a pattern in its cross-section with a patterning device;
- projecting the patterned beam of radiation onto a target portion of the layer of radiation-sensitive material on a substrate;
- and
- positioning said patterning device or said substrate with a positioning device comprising:
- a first drive unit comprising a first part and a second part, the first part being connected directly or indirectly to said patterning device or said substrate and movable relative to the second part, and
- a second drive unit configured to displace said first drive unit in at least one direction, the second part of the first drive unit being connected to said second drive unit,
- wherein the first part of the first drive unit is separated from the second part of the first drive unit by a wall.
A method for positioning a table in a lithographic apparatus comprising:
- driving an object table on a first side of a wall by generating a magnetic flux on a second side of the wall, said object table being movable in response to said flux, which travels through said wall, said wall inhibiting contaminants on said second side of the wall from reaching said object table.
Dependencies are inferred from the claim text.