Back to results
US 2005/0030495 A1Published application
Thermal proximity effects in lithography
AssigneeIntel Corporation
InventorsDavid Fryer, Vivek Singh, Thanh Phung
Life of this patent
Estimating the term…
Abstract
A proximity correction tool receives an indication of a feature in a lithographic design. The proximity correction tool predicts a film edge placement for the feature in a resist film based at least in part on thermal proximity effects in the resist film.
Claims21
A method comprising:
- receiving an indication of a feature in a lithographic design;
- and
- predicting a film edge placement for the feature in a resist film based at least in part on thermal proximity effects in the resist film.
A machine readable medium having stored thereon machine executable instructions, the execution of which to implement a method comprising:
- receiving an indication of a feature in a lithographic design;
- and
- predicting a film edge placement for the feature in a resist film based at least in part on thermal proximity effects in the resist film.
A proximity correction system comprising:
- a hard drive to store an indication of a feature in a lithographic design;
- and
- a proximity correction engine to predict a film edge placement for the feature in a resist film based at least in part on thermal proximity effects in the resist film.
Dependencies are inferred from the claim text.