Method of and apparatus for eluting impurities
AssigneeSamsung Electronics Co., Ltd.
InventorsSung-Jae Lee, Bok-Soon Ko
Life of this patent
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AssigneeSamsung Electronics Co., Ltd.
InventorsSung-Jae Lee, Bok-Soon Ko
Estimating the term…
Impurities can be eluted simultaneously from a plurality of local areas of a surface layer of a semiconductor substrate. A supporting unit supports the substrate, and a sample plate is disposed on the surface of the substrate. The sample plate has a plurality of holes that expose the local areas of the surface of the substrate. Eluant is provided onto the local areas of the surface layer of the substrate through the holes in the sample plate. The impurities are thus dissolved by the eluant to produce a sample. A nozzle transfers the sample from the local areas of the surface of the substrate to a plurality of sample cups. Therefore, samples from the surface layer of the substrate may be produced in a short amount of time.
An apparatus for eluting impurities, comprising:
An apparatus for eluting impurities, comprising:
A method of identifying impurities in a substrate, said method comprising:
Dependencies are inferred from the claim text.