Capacitor and method for fabricating the same and semiconductor device

A method for fabricating a capacitor comprising the steps of:

• forming a lower electrode on a substrate;
• forming a capacitor dielectric film on the lower electrode;
• forming an upper electrode on the capacitor dielectric film;
• forming an insulation film on the upper electrode;
• forming an opening in the insulation film down to the lower electrode;
• forming a metal layer on the insulation film;
• and
• substituting a constituent atom of the lower electrode with a metal atom of the metal layer through the opening to thereby form the lower electrode of a metal substituted layer.

A method for fabricating a capacitor comprising the steps of:

• forming a lower electrode on a substrate;
• forming a capacitor dielectric film on the lower electrode;
• forming an upper electrode on the capacitor dielectric film;
• forming an insulation film on the upper electrode;
• forming in the insulation film a first opening down to the lower electrode and a second opening down to the upper electrode;
• forming a metal layer on the insulation film;
• and
• substituting a constituent atom of the lower electrode with a metal atom of the metal layer through the first opening to thereby form the lower electrode of a metal substituted layer and substituting a constituent atom of the upper electrode with a metal atom of the metal layer through the second opening to thereby form the upper electrode of a metal substituted layer.

A method for fabricating a capacitor comprising the steps of:

• forming a lower electrode on a substrate;
• forming a capacitor dielectric film on the lower electrode;
• forming an upper electrode on the capacitor dielectric film;
• forming an insulation film on the upper electrode;
• forming an opening in the insulation film down to the upper electrode;
• forming a metal layer on the insulation film;
• and
• substituting a constituent atom of the upper electrode with a metal atom of the metal layer through the opening to form the upper electrode of a metal substituted layer.