System and method for maskless lithography using an array of improved diffractive focusing elements
AssigneeMassachusetts Institute of Technology
InventorsRajesh Menon, Dario Gil, David Carter, Henry I. Smith, George Barbastathis
Life of this patent
Estimating the term…
Abstract
A maskiess lithography system is disclosed that includes an array of blazed diffractive zone plates, each of which focuses an energy beam into an array of images in order to create a permanent pattern on an adjacent substrate in certain embodiments. In further embodiments, an array of apodized diffractive elements may also be used.
Claims14
A maskless lithography system comprising an array of blazed diffractive zone plates, each of which focuses an energy beam into an array of images in order to create a permanent pattern on an adjacent substrate.
An maskless lithography system comprising an array of apodized diffractive elements, each of which focuses an energy beam into an array of images in order to create a permanent pattern on an adjacent substrate at a focal area and is apodized to reduce at least one of the main or side lobes in an intensity distribution at a focal area.
A maskless lithography system comprising an array of diffractive elements, each of which focuses an energy beam into an array of images in order to create a permanent pattern on an adjacent substrate and has a focusing efficiency of at least 50%.
A maskless lithography system comprising an array of Besel zone plates, each of which focuses an energy beam into an array of images in order to create a permanent pattern on an adjacent substrate
Dependencies are inferred from the claim text.