Wall liner and slot liner for process chamber

Abstract

A chamber liner which includes a wall liner for protecting the interior wall surfaces of a process chamber from deposition of polymer contaminants thereon during a semiconductor fabrication process carried out in the chamber and a slot liner for protecting a wafer slot in the chamber from deposition of the polymer contaminants. The wall liner typically comprises a cylindrical liner wall that may be interrupted by an elongated slit to facilitate compressing the liner and placing the liner in the process chamber. Once positioned in the process chamber, the wall liner expands against the interior wall surfaces of the chamber. The slot liner is inserted through the wafer slot in the process chamber and communicates with a slot liner opening in the wall liner. Wafers are transferred into and out of the chamber through the slot liner.

Dependencies are inferred from the claim text.