Semiconductor device and a method of manufacturing the same
AssigneeHitachi, Ltd.
InventorsTomoo Murata, Shinobu Yabuki, Takeo Yamashita
Life of this patent
Estimating the term…
Abstract
In a method of manufacturing a semiconductor device comprising: having a first wiring extending in a first direction; and a second wiring connected to the first wiring through a connection and extending in a second direction orthogonal to the first direction, the second wiring having a surplus portion projecting from the connection in a direction opposite to the second direction, the first and second wirings are arranged such that a center of the connection is offset in the second direction from a center of the first wiring, and a projecting portion of the first wiring is disposed under the connection.
Claims39
A method of manufacturing a semiconductor device comprising:
- (a) a first wiring extending in a first direction;
- and
- (b) a second wiring connected to the first wiring through a connection and extending in a second direction orthogonal to the first direction, the second wiring having a surplus portion projecting from the connection in a direction opposite to the second direction,
- wherein the first wiring and the second wiring are arrange such that,
- (c) a center of the connection is offset in the second direction from a center of the first wiring, and
- (d) a projecting portion of the first wiring is disposed under the connection.
A method of manufacturing a semiconductor device, comprising:
- (a) a first wiring and a second wiring extending in a first direction and adjacent to each other;
- (b) a third wiring connected to the first wiring through a first connection and extending in a direction opposite to the second wiring and along a line orthogonal to the first direction, the third wiring having a first surplus portion projecting in the direction of the second wiring from the first connection;
- and
- (c) a fourth wiring connected to the second wiring through a second connection and extending along said line in a direction opposite to the first wiring, the fourth wiring having a second surplus portion projecting in the direction of the first wiring from the second connection,
- wherein the first, second, third, and fourth wirings are arranged such that,
- (d) a center of the second connection is offset in a direction opposite to the first wiring from a center of the second wiring, and
- (e) a projecting portion of the second wiring is disposed under the second connection.
A method of manufacturing a semiconductor device, comprising the steps of:
- (a) disposing a first wiring and a second wiring extending in a first direction and being adjacent to each other;
- (b) disposing a third wiring being connected to the first wiring through a first connection and extending in a second direction orthogonal to the first direction and in opposition to the second wiring, the third wiring having a first surplus portion projecting in the direction of the second wiring from the first connection;
- (c) disposing a fourth wiring being connected to the second wiring through a second connection and extending in the second direction and in opposition to the first wiring, the fourth wiring having a second surplus portion projecting in the direction of the first wiring from the second connection;
- (d) determining whether the third and the fourth wiring are positioned on one and same line and whether the distance between the first and the second surplus portions is a predetermined distance or less;
- (e) if the distance between the first and the second surplus portions is the predetermined distance or less,
- (f) displacing a center of the second connection from a center of the second wiring in a direction opposite to the first wiring;
- and
- (g) disposing a projecting portion of the second wiring under the second connection.
The method according to claim 16, wherein the distance between the third and the fifth wirings is smaller than the distance between the first and the second wirings.
A method of manufacturing a semiconductor device, comprising the steps of:
- disposing:
- (a) a first wiring extending in a first direction;
- (b) a connection on the first wiring;
- and
- (c) a terminal on the connection extending in a second direction orthogonal to the first direction and having a surplus portion, the surplus portion projecting from the connection in a direction opposite to the second direction, and
- (d) disposing a second wiring in the second direction from the terminal.
A method of manufacturing a semiconductor device, comprising the steps of:
- (a) defining a first layout line of a first wiring layer extending in a first direction and a second layout line of a second wiring layer extending in a second direction orthogonal to the first direction;
- (b) disposing virtually a first wiring along the first layout line, the first wiring having projecting portions respectively on both sides of an intersecting point of the first and the second layout lines;
- (c) disposing a second wiring along the second layout line;
- (d) disposing a connection in an overlapped region of patterns of the first and the second wirings;
- and
- (e) defining a pattern of the first wiring with the projecting portions of the first wiring disposed only under the connection.
A semiconductor device comprising:
- (a) a first wiring extending in a first direction;
- and
- (b) a second wiring connected to the first wiring through a connection and extending in a second direction orthogonal to the first direction, the second wiring having a surplus portion projecting in a direction opposite to the second direction,
- (c) the connection being formed so that a center thereof is offset in the second direction from a center of the first wiring, and
- (d) the first wiring having a projecting portion formed under the connection.
A semiconductor device comprising:
- (a) a first wiring and a second wiring extending in a first direction and being adjacent to each other;
- (b) a third wiring being connected to the first wiring through a first connection and extending in a second direction orthogonal to the first direction and in opposition to the second wiring, the third wiring having a first surplus portion projecting in the direction of the second wiring from the first connection;
- and
- (c) a fourth wiring being connected to the second wiring through a second connection and extending in the second direction and in opposition to the first wiring, the fourth wiring having a second surplus portion projecting in the direction of the first wiring from the second connection;
- (d) the second connection being formed so that a center thereof is offset from a center of the second wiring in a direction opposite to the first wiring, and
- (e) the second wiring having a projecting portion formed under the second connection.
A semiconductor device comprising:
- (a) a first wiring extending in a first direction and having at least one projecting portion;
- and
- (b) a second wiring connected to the first wiring through a first connection and extending from the first connection in a second direction orthogonal to the first direction, the second wiring having a first surplus portion projecting from the first connection in a direction opposite to the second direction,
- the first connection being formed on the first wiring and the projecting portion thereof.
A semiconductor device comprising:
- (a) a first wiring extending in a first direction and having at least one projecting portion;
- (b) a second wiring connected to the first wiring through a first connection and extending from the first connection in a second direction orthogonal to the first direction, the second wiring having a first surplus portion projecting from the first connection in a direction opposite to the second direction;
- and
- (c) a third wiring connected to the first wiring through a second connection and extending from the second connection in a second direction orthogonal to the first direction, the third wiring having a second surplus portion projecting from the second connection in a direction opposite to the second direction,
- the first connection being formed on the first wiring, and the second connection being formed on the first wiring and the projecting portion thereof.
Dependencies are inferred from the claim text.