Method of surface texturizing
AssigneeApplied Materials, Inc.
InventorsAlan R. Popiolkowski, Shannon M. Hart, Marc O. Schweitzer, Alan B. Liu, Jennifer L. Watia, Brian West, Mark Menzie
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AssigneeApplied Materials, Inc.
InventorsAlan R. Popiolkowski, Shannon M. Hart, Marc O. Schweitzer, Alan B. Liu, Jennifer L. Watia, Brian West, Mark Menzie
Estimating the term…
A method and system for providing a texture to a surface of a workpiece, such as a chamber component is provided. The method comprises providing a workpiece to a texturizing chamber and scanning a beam of electromagnetic energy across the surface of the workpiece to form a plurality of features thereon. The features formed are generally depressions, protuberances, and combinations thereof. The chamber components may include, for example, a chamber shield and related assembly, a target, a shadow ring, a contact ring, a substrate support or other component disposable within a processing chamber. Also provided is a method of reducing contamination in a process chamber. The method comprises scanning a beam of electromagnetic energy across a surface of one or more process chamber components to form a plurality of features thereon, positioning the one or more chamber components into a process chamber, and initiating a process sequence within the process chamber.
A method of providing a texture to a surface of a component for use in a semiconductor process chamber, comprising:
A method of providing a texture to a surface of a component, comprising:
A process chamber component for use in a process chamber, comprising:
Dependencies are inferred from the claim text.