Methods of coating contact holes in MEMS and similar applications
OwnerBrian Martin, John Shannon +1inventors
InventorsBrian Martin, John Shannon, John Perring
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Abstract
A method of coating contact holes in MEMS and micro-machining applications comprises: providing an insulating layer above an integrated circuit; providing a resist layer above the insulating layer; patterning and developing the resist layer in order to form at least one contact aperture in the resist layer; isotropically etching the insulating layer using the resist layer as a mask, so that a contact hole is formed in the insulating layer; and coating the walls of said contact hole with a layer of metal.
Claims10
A method of coating contact holes in MEMS and micro-machining applications, the method comprising:
- providing an insulating layer above an integrated circuit;
- providing a resist layer above the insulating layer;
- patterning and developing the resist layer in order to form at least one contact aperture in the resist layer;
- isotropically etching the insulating layer using the resist layer as a mask, so that a contact hole is formed in the insulating layer;
- and
- coating the walls of said contact hole with a layer of metal.
Dependencies are inferred from the claim text.