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US 2003/0215758 A1Published application
Photosensitive polymer and chemically amplified resist composition comprising the same
AssigneeSamsung Electronics Co., Ltd.
InventorsHyun-Woo Kim, Sang-Gyun Woo, Myoung-Ho Jung
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Abstract
A photosensitive polymer having hydrophobic and hydrophilic portions homogenously distributed therein and a resist composition comprising the photosensitive polymer. The photosensitive polymer having a formula: 1 wherein R1 and R2 are independently a hydrogen atom or a methyl group, R3 is an acid-labile C4˜C20 hydrocarbon group, R4 is a hydrophilic group, a/(a+b+c+d+e)=0.01˜0.6, b/(a+b+c+d+e)=0.05˜0.7, c/(a+b+c+d+e)=0.01˜0.6, d/(a+b+c+d+e)=0.1˜0.5, and e/(a+b+c+d+e)=0.01˜0.5.
Claims22
A photosensitive polymer having a formula:
- 13
- wherein R1 and R2 are independently a hydrogen atom or a methyl group, R3 is an acid-labile C4˜C20 hydrocarbon group, R4 is a hydrophilic group, a/(a+b+c+d+e)=0.01˜0.6, b/(a+b+c+d+e)=0.05˜0.7, c/(a+b+c+d+e)=0.01˜0.6, d/(a+b+c+d+e)=0.1˜0.5, and e/(a+b+c+d+e)=0.01˜0.5.
A resist composition comprising:
- (a) a photosensitive polymer having a formula:
- 15
- wherein R1 and R2 are independently a hydrogen atom or a methyl group, R3 is an acid-labile C4˜C20 hydrocarbon group, R4 is a hydrophilic group, a/(a+b+c+d+e)=0.01˜0.6, b/(a+b+c+d+e)=0.05˜0.7, c/(a+b+c+d+e)=0.01˜0.6, d/(a+b+c+d+e)=0.1˜0.5, and e/(a+b+c+d+e)=0.01˜0.5;
- and
- (b) a photoacid generator (PAG).
2 more elements
Dependencies are inferred from the claim text.