Illuminator for a lithography apparatus, a lithography apparatus comprising such an illuminator, and a manufacturing method employing such a lithography apparatus

A lithographic projection apparatus comprising:

• a radiation system to provide a projection beam of radiation, comprising an illumination system that defines an intensity distribution of the projection beam at a plane, the illumination system comprising adjusting structure to control an angular intensity of the intensity distribution such that at least one localized portion of the intensity distribution has a higher intensity than at least another localized portion of the intensity distribution;
• patterning structure that patterns the projection beam according to a desired pattern;
• a substrate table to hold a substrate;
• a projection system to image the patterned beam onto a target portion of the substrate;
• the adjusting structure comprising at least one exchanger for inserting and removing at least one of a plurality of optical elements into and out of the projection beam path, each of the said optical elements defining a particular intensity distribution;
• the exchanger being operable such that the desired pattern comprises an intensity distribution corresponding to a hybrid illumination pattern.