Projection exposure apparatus using wavefront detection
AssigneeCanon Kabushiki Kaisha
InventorRyo Sasaki
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Abstract
Disclosed is a method of measuring a wavefront aberration of a predetermined optical system being serviceable for imaging a pattern, wherein the method includes storing information related to a light intensity distribution on a pupil plane of the predetermined optical system in a reference state, and detecting a wavefront of the predetermined optical system in an arbitrary state, on the basis of the stored information.
Claims15
A method of measuring a wavefront aberration of a predetermined optical system being serviceable for imaging a pattern, said method comprising the steps of:
- storing information related to a light intensity distribution on a pupil plane of the predetermined optical system in a reference state;
- and
- detecting a wavefront of the predetermined optical system in an arbitrary state, on the basis of the stored information.
A method of measuring a wavefront of an optical system having a focal plane and a pupil plane placed in a Fourier-to-inverse Fourier relation, said method comprising the steps of:
- storing information related to a light intensity distribution on a pupil plane of the optical system in a reference state;
- and
- detecting a wavefront of the optical system in an arbitrary state, on the basis of the stored information.
A projection exposure apparatus for imaging and printing a pattern, formed on a first object, upon a second object through a projection optical system, said apparatus comprising:
- storing means for storing information related to a light intensity distribution on a pupil plane of the projection optical system in a reference state;
- and
- detecting means for detecting a wavefront of the projection optical system in an arbitrary state, on the basis of the stored information.
Dependencies are inferred from the claim text.