Intermediate layer composition for three-layer resist process and pattern formation method using the same
AssigneeFuji Photo Film Co., Ltd.
InventorKazuya Uenishi
Life of this patent
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Abstract
An intermediate layer composition for a three-layer resist process comprising (A) an octakis(silsesquioxane) skeleton-containing polymer obtained by hydrosilylation polymerization of a compound represented by formula (I) defined in the specification with bis(substituted ethynyl) compound in the presence of a platinum-containing catalyst.
Claims9
An intermediate layer composition for a three-layer resist process comprising (A) an octakis(silsesquioxane) skeleton-containing polymer obtained by hydrosilylation polymerization of a compound represented by the following formula (I) with a compound represented by the following formula (II) in the presence of a platinum-containing catalyst:
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- wherein Ra to Rh each independently represent a hydrogen atom, a halogen atom or an alkyl group, and at least two of Ra to Rh are hydrogen atoms;
- R1—C≡C—(R2)a—C≡C—R3 (II)
- wherein R1 and R3 each independently represent a monovalent organic or organometallic group, R2 represents a bivalent organic or organometallic group, and a represents 0 or 1.
Dependencies are inferred from the claim text.