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US 2003/0170987 A1Published application
Method for manufacturing slurry
OwnerKi Hong Yanginventor
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Abstract
Disclosed is a method for manufacturing slurry capable of stably polishing polycrystal silicon without change of surface roughness in a Chemical Mechanical Polishing process. The disclosed includes hydroxide ion added to the slurry in order to decrease acidity and increase alkalinity.
Claims7
A method for manufacturing slurry for polishing polycrystal silicon and oxide including acid components such as HNO3, HF and CH3COOH, wherein hydroxide ion is added to the slurry in order to decrease acidity and increase alkalinity.
Dependencies are inferred from the claim text.