Thermal processing apparatus and thermal processing method
AssigneeDainippon Screen Mfg. Co., Ltd.
InventorsMitsukazu Takahashi, Tosiyuki Kobayashi, Toshimitsu Funayoshi
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Abstract
A thermal processing apparatus, performing processing accompanied with heating on a substrate, having an upper lamp group directed toward a prescribed direction and a lower lamp group perpendicularly intersecting with the upper lamp group is provided with a lower reflector between the upper and lower lamp groups. The lower reflector is so provided as to reflect light from lamps, included in the lower lamp group, present on both end regions in relation to the direction of arrangement. Thus, the thermal processing apparatus can efficiently irradiate an auxiliary ring with reflected light from the lower lamp group and improve temperature uniformity when heating the substrate.
Claims34
A thermal processing apparatus irradiating a substrate with light for performing processing accompanied with heating, comprising:
- a first reflecting surface opposed to the main surface of said substrate to be processed;
- a first lamp group including bar lamps arranged to be directed toward a prescribed direction along said first reflecting surface respectively;
- a second lamp group including bar lamps arranged to be directed toward a direction different from said prescribed direction respectively between said first lamp group and said main surface;
- and
- a second reflecting surface reflecting light received from lamps, included in said second lamp group, present on both end regions in relation to the direction of arrangement between said first lamp group and said second lamp group.
A thermal processing apparatus irradiating a substrate with light for performing processing accompanied with heating, comprising:
- a reflecting surface opposed to the main surface of said substrate to be processed;
- a lamp group arranged along said third reflecting surface;
- and
- an auxiliary ring outwardly spreading from the outer periphery of said substrate along said outer periphery,
- whereby said reflecting surface reflects light received from a lamp included in said lamp group and substantially condenses said light on said auxiliary ring.
A thermal processing apparatus irradiating a substrate with light for performing processing accompanied with heating, comprising:
- a reflecting surface opposed to the main surface of said substrate to be processed;
- and
- a lamp group including bar lamps arranged to be directed toward a prescribed direction along said reflecting surface respectively, wherein
- said reflecting surface has a concave surface, formed along a lamp included in said lamp group, having a symmetry plane inclined from a normal direction of said main surface.
A thermal processing method of irradiating a substrate with light for performing processing accompanied with heating, comprising:
- a first irradiation step of irradiating the main surface of said substrate to be processed with light through a first lamp group including bar lamps arranged to be directed toward a prescribed direction along a first reflecting surface opposed to said main surface respectively;
- a second irradiation step of irradiating said main surface with light through a second lamp group including bar lamps arranged to be directed toward a direction different from said prescribed direction respectively between said first lamp group and said main surface;
- and
- a reflection step of reflecting light from lamps, included in said second lamp group, present on both end regions in relation to the direction of arrangement by a second reflecting surface arranged between said first lamp group and said second lamp group.
A thermal processing method of irradiating a substrate with light for performing processing accompanied with heating, comprising:
- a first irradiation step of irradiating the main surface of said substrate to be processed with a lamp group arranged along a reflecting surface opposed to said main surface;
- a step of holding said substrate with an auxiliary ring outwardly spreading from the outer periphery of said substrate along said outer periphery;
- and
- a first reflection step of reflecting light from a lamp included in said lamp group with said reflecting surface and substantially condensing said light on said auxiliary ring.
A thermal processing method of a substrate, comprising:
- a first irradiation step of irradiating the main surface of said substrate to be processed with a lamp group including bar lamps arranged to be directed toward a prescribed direction along a reflecting surface opposed to said main surface respectively;
- and
- a step of heating said substrate, wherein
- said reflecting surface has a concave surface, formed along a lamp included in said lamp group, having a symmetry plane inclined from the normal direction of said main surface.
Dependencies are inferred from the claim text.