Heterojunction field-effect transistor
AssigneeMurata Manufacturing Co., Ltd.
InventorsMakoto Inai, Hidehiko Sasaki
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AssigneeMurata Manufacturing Co., Ltd.
InventorsMakoto Inai, Hidehiko Sasaki
Estimating the term…
A heterojunction field-effect transistor having a high breakdown voltage and a low series resistance during operation suitable for use in microwave and millimeter-wave band oscillators and power amplifiers is provided. The heterojunction field-effect transistor has a gate recess structure and includes a gate electrode, a barrier layer, a contact layer, and a recess layer formed between the barrier layer and the contact layer. The recess layer is constituted from a plurality of recess sublayers, and the carrier density of the lowermost sublayer of the recess sublayers is ⅓ to 3 times the carrier density of the other recess sublayers.
A heterojunction field-effect transistor having a gate recess structure, the heterojunction field-effect transistor comprising:
A heterojunction field-effect transistor having a gate recess structure, the heterojunction field-effect transistor comprising:
The heterojunction field-effect transistor according to claim 12, wherein the lower sublayer comprises AlGaAs and has a thickness in the range of 5 to 10 nm, and the upper recess sublayer comprises GaAs and has a thickness in the range of 20 to 30 nm.
Dependencies are inferred from the claim text.