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US 2002/0170498 A1Published application
Chemical vapor deposition apparatus
AssigneeLG. Philips LCD Co., Ltd.
InventorYoung Hun Paik
Life of this patent
Estimating the term…
Abstract
A chemical vapor deposition apparatus includes a ground voltage source, a susceptor for placing a substrate, a center pin passing through the susceptor for lifting the substrate, and a ground member for connecting the center pin to the ground voltage source.
Claims18
A chemical vapor deposition apparatus, comprising:
- a ground voltage source;
- a susceptor for placing a substrate;
- a center pin passing through the susceptor for lifting the substrate;
- and
- a ground member for connecting the center pin to the ground voltage source.
2 more elements
A chemical vapor deposition apparatus, comprising:
- a chamber;
- a ground voltage source;
- a susceptor within the chamber;
- a substrate on the susceptor;
- a center pin passing through the susceptor for lifting the substrate;
- a plate for driving the center pin;
- and
- a ground member for connecting the center pin to the ground voltage source.
5 more elements
Dependencies are inferred from the claim text.