Substrate processing method and substrate processing apparatus

A substrate processing method, comprising the steps of:

• applying an insulating film material on a substrate;
• applying ultraviolet rays to a front face of the insulating film material in an inert gas atmosphere;
• and thereafter
• bringing an atmosphere over the insulating film material to an oxygen atmosphere.

A substrate processing method, comprising the steps of:

• applying an insulating film material on a substrate;
• applying ultraviolet rays to a front face of the insulating film material in a processing chamber with an inert gas atmosphere;
• thereafter
• applying ultraviolet rays to the front face of the insulating film material under an atmosphere in the processing chamber into which oxygen has been allowed to flow;
• and
• bringing the inside of the processing chamber to an inert gas atmosphere.

A substrate processing apparatus, comprising:

• a holding plate for holding a substrate;
• an ultraviolet-ray irradiation lamp disposed above the holding plate for applying ultraviolet rays to a front face of the substrate;
• means for bringing a portion between the substrate held on the holding plate and the ultraviolet-ray irradiation lamp to an inert gas atmosphere;
• and
• means for switching at least the inert gas atmosphere over the front face of the substrate held on the holding plate to an oxygen atmosphere.

A substrate processing apparatus, comprising:

• a holding plate for holding a substrate and ascendable and descendable between a first area and a second area below the first area;
• a vertically driving mechanism for vertically driving the holding plate between the first area and the second area;
• an ultraviolet-ray irradiation lamp disposed above the holding plate for applying ultraviolet rays to a front face of the substrate held by the holding plate;
• means for blasting an inert gas toward the first area;
• and
• means for blasting oxygen gas toward the second area.

A substrate processing apparatus, comprising:

• a holding plate for holding a substrate to be ascendable and descendable between a first area and a second area below the first area;
• a vertically driving mechanism for vertically driving the substrate held by the holding plate between the first area and the second area;
• an ultraviolet-ray irradiation lamp disposed above the holding plate for applying ultraviolet rays to a front face of the substrate held by the holding plate;
• means for blasting an inert gas toward the first area;
• and
• means for blasting oxygen gas toward the second area.

A substrate processing apparatus, comprising:

• a holding plate for holding a substrate and rotatable;
• a rotationally driving mechanism for rotationally driving the holding plate;
• an ultraviolet-ray irradiation lamp, disposed above the holding plate along at least a radial direction of rotation of the holding plate, for applying ultraviolet rays to the substrate held by the holding plate;
• an inert gas blast portion, disposed along one side of the ultraviolet-ray irradiation lamp, for blasting an inert gas toward the front face of the substrate held on the holding plate;
• and
• an oxygen gas blast portion, disposed along the other side of the ultraviolet-ray irradiation lamp, for blasting oxygen gas toward the front face of the substrate held on the holding plate.