Method for producing thin films
AssigneeUniversity of Delaware
InventorsRobert W. Birkmire, Erten Eser, Gregory M. Hanket, Brian E. McCandless
Life of this patent
Estimating the term…
Abstract
Thin films are produced by a method wherein a material is heated in a furnace placed inside a vacuum system. An inert gas is flown over/through the heated material. The vapors of the material are entrained in the carrier gas which is then directed onto a substrate heated to a temperature below that of the furnace temperature and placed in close proximity to the exit of the furnace.
Claims1
A method for producing thin film comprises heating a material to a sufficient temperature in a furnace placed inside a vacuum system, flowing an inert gas carrier over through the heated material and entraining the vapors of the material in the carrier gas, and directing the carrier gas containing the vapors onto a substrate heated to a temperature below that of the furnace temperature and placed in close proximity to the exit of the furnace.
Dependencies are inferred from the claim text.