System for reducing wafer contamination
AssigneeSEH America, Inc.
InventorsMasami Nakano, Michito Sato, Brian D. West
Life of this patent
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Abstract
A system for conditioning an alkaline etching solution for reducing contamination in a silicon wafer etching process. The system includes a conditioning tank for mixing a conditioned alkaline etching solution, the conditioned alkaline etching solution including a conditioning chemical; a conditioning chemical introduction system configured to add the conditioning chemical to the conditioning tank; and a buffer tank for storing the conditioned basic etching solution before using the conditioned alkaline etching solution in an etching process.
Claims26
A system for conditioning an alkaline etching solution for reducing contamination in a silicon wafer etching process, comprising:
- a conditioning tank for mixing a conditioned alkaline etching solution, the conditioned alkaline etching solution including a conditioning chemical;
- a conditioning chemical introduction system configured to add the conditioning chemical to the conditioning tank;
- and
- a buffer tank for storing the conditioned alkaline etching solution before the conditioned alkaline etching solution is used in an etching process.
A system for conditioning an alkaline etching solution to reduce contamination in a silicon wafer etching process, the system comprising:
- means for holding the alkaline etching solution while the alkaline etching solution is being conditioned;
- means for adding a conditioning chemical to the alkaline etching solution while the alkaline etching solution is in the holding means;
- and
- means for storing the alkaline etching solution after the conditioning chemical has been added to the alkaline etching solution.
Dependencies are inferred from the claim text.