Sputtering apparatus

Apparatus as claimed in any one of the preceding claims wherein the re-sputtering surface is formed on a ring.

Apparatus as claimed in any one of the preceding claims wherein the surface is or has at least a coating of target material.

Apparatus as claimed in any one of the preceding claims further comprising an adhesion enhancing coating on the re-sputtering surface for enhancing the adhesion of target coating material to the surface.

Apparatus as claimed in any one of the preceding claims further including means for DC biasing the re-sputtering surface.

Apparatus as claimed in any one of the preceding claims further comprising an RF coil disposed in the chamber between the target and the re-sputtering surface.

Apparatus as claimed in any one of the preceding claims wherein the coil is made of stainless steel.

Apparatus as claimed in any one of the preceding claims wherein the coating on the re-sputtering surface and/or the coil is provided by sputtering from the target during a pre-treatment operation of the apparatus.

Apparatus as claimed in any one of the preceding claims including control means for operating the apparatus in a first pre-treatment mode, in which there is no workpiece, to coat the re-sputtering surface and/or the coil and in a second deposition mode in which target material is deposited on the workpiece.

Sputter apparatus for treating a workpiece including a chamber, a target disposed in the chamber, a workpiece support located in the chamber opposite the target and a RF coil disposed within the chamber between the target and the support characterised in that the coil is made from non-target material and carries or is provided with prior to a treatment of a workpiece a coating of target material and in that a further target is located between the coil and the support for sputtering material onto that part of the coil which is in shadow with respect to the first mentioned target.

Apparatus as claimed in claim 19 or claim 20 wherein the further target is generally a frusto-triangle in section.

Sputtering apparatus for depositing material onto a workpiece including a chamber and a target disposed in the chamber characterised in that the apparatus further comprises a re-sputtering surface of electrically conductive non-target material for receiving a coating of target material for re-sputtering and means for biasing the surface such that a coating is sputtered from the surface during coating of a workpiece.

Sputtering apparatus for treating a workpiece including a chamber, a target disposed in the chamber, a workpiece support located in the chamber opposite the target and a RF coil disposed within the target and the support characterised in that the coil is made from non-target material and carries, or is provided with prior to a treatment of a workpiece, a coating of target material, the coil having shielding for any part which is not sufficiently coated.

Sputtering apparatus for treating a workpiece substantially as herein before described with reference to the accompanying drawings.