Photomask blank and photomask
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsHideo Kaneko, Yukio Inazuki, Satoshi Okazaki
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Abstract
A photomask blank comprising a transparent substrate on which are formed at least one light-shielding film and at least one antireflective film minimizes film stress and eliminates substrate warp following deposition of the light-shielding film and the antireflective film, when each film is composed of a CrCO layer, a CrCON layer, or a combination of CrCO and CrCON layers. The photomask blank can be accurately patterned without distortion to give a photomask.
Claims8
A photomask blank comprising a transparent substrate and, on the substrate, at least one light-shielding film and at least one antireflective film;
- wherein each film is composed of a CrCO layer, a CrCON layer, or a combination of CrCO and CrCON layers.
Dependencies are inferred from the claim text.