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US 2001/0036602 A1Published application
Analog relief microstructure fabrication
OwnerStephen P. McGrew, Robert O. Warringtoninventors
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Abstract
A microfabrication technique, applications thereof, and mass-manufacturing techniques therefore, in which an analog mask is created and used to control exposure of a resist material to actinic radiation in order to create analog products at the microscale.
Claims21
A method for fabricating analog microstructures comprising the steps of:
- a) fabricating an analog mask comprising a layer of mask material, said mask material absorbing a variable amount of a first type of radiation, wherein said amount of absorption varies with the thickness of said mask material layer;
- b) directing said first type of radiation through said analog mask to expose a first resist material to said first type of radiation;
- and
- c) creating an analog relief in said first resist material by exposing said first resist material to a first solvent, wherein said first solvent dissolves said first resist material at different rates depending on the amount of exposure of said first resist material to said first type of radiation.
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Dependencies are inferred from the claim text.