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US 2001/0026905 A1Published application
Positive resist composition
AssigneeSumitomo Chemical Company, Limited
InventorsYasunori Uetani, Hiroshi Moriuma, Yoshiyuki Takata
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Abstract
A positive resist composition, having a superior resolution as well as good resist performances such as sensitivity, depth of focus and profile, is described and includes a novolac resin, a radiation-sensitive quinonediazide compound and a thioxanthone compound represented by the following formula (I): 1 wherein R1, R2, R3, R4, R5, R6, R7 and R8 independently represent hydrogen, halogen, alkyl, alkoxy, aryl, carboxyl or alkoxycarbonyl.
Claims7
A method for producing a semiconductor comprising the steps of:
- dissolving a positive resist composition represented by Formula (I):
- 4
- in a suitable solvent;
- and
- applying said positive resist composition to a silicone wafer to thereby form a resist film.
2 more elements
Dependencies are inferred from the claim text.