US 2001/0012456 A1 · Developing method and developing apparatus

Abstract

When a resist film formed on a substrate is exposed in a predetermined pattern and thereafter an exposed pattern is developed, a substance capable of decreasing fluidity of the developing solution is added to the developing solution, the developing solution to which the substance is added is caused to become low-fluid under a predetermined condition, the developing solution is applied onto the exposed resist film on the substrate, and thereafter a predetermined trigger is given to the developing solution to cause the developing solution to become high-fluid so as to allow developing to progress. Thereby, line width can be made uniform and defects do not tend to occur during coating of the developing solution.

Claims11

Dependent claims

A developing method for developing an exposed pattern after a resist film formed on a substrate is exposed in a predetermined pattern, comprising the steps of:

(a) adding a substance capable of decreasing fluidity of a developing solution to the developing solution;
(b) causing the developing solution to which the substance is added to become low-fluid under a predetermined condition and applying the developing solution onto the exposed resist film on the substrate;
and
(c) giving a predetermined trigger to the developing solution to cause the developing solution to become high-fluid to allow developing to progress.

1 more element

Dependencies are inferred from the claim text.

Developing method and developing apparatus

Life of this patent

Developing method and developing apparatus

Life of this patent

Abstract

Claims11