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US 12,772,792 B2Granted
System for monitoring performance of electrostatic chucks in substrate processing systems
AssigneeLam Research Corporation
InventorsLiwei An, Ramesh Chandrasekharan, Sergey Georgiyevich Belostotskiy, Tu Hong, Chunhai Ji, Noah Elliot Baker
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Abstract
A system for monitoring health of a pedestal of a processing chamber comprises a memory storing instructions and a processor. The processor is configured to execute the instructions to sense one or more currents through one or more electrodes arranged in the pedestal; generate one or more metrics based on the one or more currents; and determine a health of the pedestal based on the one or more metrics.
Claims17
A system for monitoring health of a pedestal of a processing chamber, the system comprising:
- a memory storing instructions;
- and
- a processor configured to execute the instructions to:
- sense currents through one or more electrodes arranged in the pedestal;
- generate a plurality of metrics based on a statistical analysis of the currents, the statistical analysis comprising generating averages of the currents and differences between the currents, and comprising generating maximum and mean values based on the averages and differences;
- select a set of metrics from the plurality of metrics based on a type of the pedestal for determining a health of the pedestal;
- and
- determine the health of the pedestal by comparing the selected set of metrics to respective thresholds.
5 more elements
Dependencies are inferred from the claim text.