Capacitor and method of manufacturing same

A method of manufacturing a capacitor comprising:

• forming a first electrode on a substrate;
• forming a dielectric film on the first electrode;
• forming a second electrode on the dielectric film, the second electrode having an outer periphery positioned inside the outer periphery of the first electrode in a plan view viewed from above in a direction normal to an upper surface of the substrate;
• forming a third electrode that is in contact with the second electrode in a region inside the second electrode in the plan view, is separated upward from the second electrode and the dielectric film outside the region in the plan view, and has an outer periphery positioned inside the outer periphery of the first electrode and an outer periphery of the dielectric film in the plan view;
• removing an unnecessary layer formed on an upper surface of the third electrode in a state where an upper surface of the dielectric film outside the outer periphery of the second electrode in the plan view is exposed;
• and
• forming a protective film covering the second electrode and the third electrode and being in contact with the second electrode and the third electrode after removing the unnecessary layer, and wherein a thickness of the protective film on the third electrode is the same as that of the protective film on the second electrode.

A capacitor comprising:

• a substrate;
• a first electrode provided on the substrate;
• a dielectric film provided on the first electrode;
• a second electrode provided on the dielectric film and having an outer periphery positioned inside the outer periphery of the first electrode in a plan view viewed from above in a direction normal to an upper surface of the substrate;
• and
• a third electrode that is in contact with the second electrode,
• wherein in the plan view, a lower surface of the third electrode contacts the second electrode in an inner region of the second electrode, and an upper surface of the third electrode has an outer periphery located outside an outer periphery of the second electrode and located inside the outer periphery of the first electrode and the outer periphery of the dielectric film,
• wherein in a cross-sectional view, the upper surface of the third electrode is spaced upward from the outer surface of the second electrode, and
• wherein a distance between the outer periphery of the third electrode and the outer periphery of the second electrode in the plan view is 0.3 times or more a height between the outer periphery of a lower surface of the third electrode parallel to the upper surface of the substrate and an upper surface of the second electrode as viewed from a plane direction of the upper surface of the substrate.

A capacitor comprising:

• a substrate;
• a first electrode provided on the substrate;
• a dielectric film provided on the first electrode;
• a second electrode provided on the dielectric film and having an outer periphery positioned inside the outer periphery of the first electrode in a plan view viewed from above in a direction normal to an upper surface of the substrate;
• and
• a third electrode that is in contact with the second electrode,
• wherein in the plan view, a lower surface of the third electrode contacts the second electrode in an inner region of the second electrode, and an upper surface of the third electrode has an outer periphery located outside an outer periphery of the second electrode and located inside the outer periphery of the first electrode and the outer periphery of the dielectric film,
• wherein in a cross-sectional view, the upper surface of the third electrode is spaced upward from the outer surface of the second electrode, and
• wherein a height of the outer periphery of the lower surface of the third electrode parallel to the upper surface of the substrate and the upper surface of the second electrode as viewed from a plane direction of the upper surface of the substrate is 0.5 times or more a distance between the outer periphery of the third electrode and an outer periphery of the inner region in the plan view.