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AssigneeASML Netherlands B.V.
InventorsYunan Zheng, Yongfa Fan, Mu Feng, Leiwu Zheng, Jen-Shiang Wang, Ya Luo, Chenji Zhang, Jun Chen, Zhenyu Hou, Jinze Wang, Feng Chen, Ziyang Ma, Xin Guo, Jin Cheng
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A method for generating modified contours and/or generating metrology gauges based on the modified contours. A method of generating metrology gauges for measuring a physical characteristic of a structure on a substrate includes obtaining (i) measured data associated with the physical characteristic of the structure printed on the substrate, and (ii) at least portion of a simulated contour of the structure, the at least a portion of the simulated contour being associated with the measured data; modifying, based on the measured data, the at least a portion of the simulated contour of the structure; and generating the metrology gauges on or adjacent to the modified at least a portion of the simulated contour, the metrology gauges being placed to measure the physical characteristic of the simulated contour of the structure.
A method for metrology, the method comprising:
A computer program product comprising a non-transitory computer readable medium having instructions therein, the instructions, when executed by a computer system, configured to cause the computer system to at least:
Dependencies are inferred from the claim text.