Method and device for changing test substrates in a continuous-flow vacuum system, treatment method, and continuous-flow vacuum system

A method for changing test substrates, the method comprising a plurality of successive treatment steps in a continuous-flow vacuum system which has a plurality of treatment stations and a transport device comprising at least one carrier for holding both to-be-treated substrates and test substrates, and for transporting the to-be-treated substrates and the test substrates through the plurality of treatment stations, wherein:

• at least two untreated test substrates are fed into the continuous-flow vacuum treatment system at a beginning of a process run and discharged after completion of the process run;
• for each of at least two of the successive treatment steps, an untreated test substrate is treated together with the to-be-treated substrates;
• after a first treatment step of the successive treatment steps, a first test substrate treated in the process run is removed from a measuring position on the at least one carrier occupied by the first test substrate during the first treatment step and is the deposited in an empty position on the at least one carrier having no test substrate;
• and
• after removal of the first test substrate treated in the process run, a second, still untreated test substrate is removed from a holding position on the carrier and is deposited in the measuring position, from which the first test substrate was removed, for the purpose of being fed to a subsequent treatment step of the successive treatment steps.