Multi-column large field of view imaging platform
AssigneeKLA Corporation
InventorsYonatan Vaknin, Amnon Manassen, Andrew V. Hill
Life of this patent
Estimating the term…
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AssigneeKLA Corporation
InventorsYonatan Vaknin, Amnon Manassen, Andrew V. Hill
Estimating the term…
A measurement system may include an illumination source configured to generate one or more illumination beams and one or more objective lenses. One or more of the objective lenses may be configured as illumination objective lenses to direct illumination from the illumination source to one or more targets on a sample. One or more of the objective lenses may be configured as collection objective lenses, where each of the collection objective lenses is configured to collect a selected diffraction order of the illumination from the sample. The system may further include one or more detectors, each configured to image the sample based on at least one of the selected diffraction orders from at least one of the collection objective lenses and a controller to generate measurements of the one or more targets on the sample based on one or more images from the detectors.
A measurement system comprising:
A measurement system comprising:
A method comprising:
Dependencies are inferred from the claim text.