Thin film deposition apparatus having multi-stage heaters and thin film deposition method using the same

A thin film deposition apparatus comprising:

• a chamber configured to process a plurality of substrates;
• a plurality of heater members disposed to correspond to the substrates to heat the substrates;
• a plurality of lift pins configured to be elevated through the heater members and support lower surfaces of the substrates;
• a plurality of support plates on which lower ends of the lift pins are configured to be seated;
• a plurality of support columns coupled with and supporting the heater members;
• and
• a plurality of spray ports configured to supply a process gas to the substrates,
• wherein the support plates are mounted on a plurality of seats formed on at least one side of the chamber, and configured to be elevated together with the heater members when the heater members are elevated,
• wherein a plurality of fingers protruding in a lateral direction are formed on the support columns, and when the support columns are elevated together with the heater members, the fingers are configured to lift lower surfaces of the support plates,
• wherein the seats protrude from a sidewall of the chamber toward an inside of the chamber,
• wherein the seats are formed with a plurality of steps, and
• wherein the support plates are configured to be placed at right positions on the seats when the support plates are lowered together with the heater members.

A thin film deposition apparatus comprising:

• a chamber configured to process a plurality of substrates;
• a plurality of heater members disposed to correspond to the substrates to heat the substrates;
• a plurality of lift pins configured to be elevated through the heater members and support lower surfaces of the substrates;
• a plurality of support plates on which lower ends of the lift pins are configured to be seated;
• a plurality of support columns coupled with and supporting the heater members;
• and
• a plurality of spray ports configured to supply a process gas to the substrates,
• wherein the support plates are mounted on a plurality of seats formed on at least one side of the chamber, and configured to be elevated together with the heater members when the heater members are elevated,
• wherein a plurality of fingers protruding in a lateral direction are formed on the support columns, and when the support columns are elevated together with the heater members, the fingers are configured to lift lower surfaces of the support plates, and
• wherein at a load position where the lift pins are maximally exposed to upper sides of the heater members so that the substrates are loaded or unloaded, the support plates are configured to maintain a state mounted on the seats even if the heater members are elevated.