Showerhead and substrate processing apparatus using the same
AssigneeASM IP Holding B.V.
InventorsKyungEun Lee, HaRim Kim, IkDu Nam
Life of this patent
Estimating the term…
Abstract
A showerhead for supplying a gas includes a showerhead body having an upper surface and a lower surface opposite to the upper surface, and a plurality of through-holes formed in the showerhead body so that the gas passes through from the upper surface toward the lower surface, wherein a size of a cross-sectional area of each through-hole of the plurality of through-holes in the lower surface is the same, while the size of the cross-sectional area of each through-hole in the upper surface increases from a center of the showerhead toward an edge thereof.
Claims20
A showerhead for supplying a gas, comprising:
- a showerhead body having an upper surface and a lower surface opposite to the upper surface;
- and a plurality of through-holes formed in the showerhead body so that the gas passes through from the upper surface toward the lower surface, wherein a size of a cross-sectional area of each through-hole of the plurality of through-holes in the lower surface is the same as each other, while the size of the cross-sectional area of each through-hole in the upper surface increases from a center of the showerhead toward an edge thereof, wherein the showerhead is classified into a central region and at least one external region, the central region having a predetermined radius including the center of the showerhead in which a portion of the plurality of through-holes are formed, and the at least one external region arranged in a ring shape consecutively in a radial direction from outside of the central region in which another portion of the plurality of through-holes are formed, and wherein a size of the cross-sectional area of each through-hole in the external region is greater than a size of the cross-sectional area of each through-hole in the upper surface in the central region, and wherein a size of a cross-sectional area of holes in at least a sub-through-hole group of the external region decreases linearly from the upper surface to the lower surface thereof.
A showerhead for supplying a gas comprising:
- a showerhead body having an upper surface and a lower surface opposite to the upper surface;
- and
- a plurality of through-holes formed in the showerhead body so that the gas passes through from the upper surface toward the lower surface, wherein
- a size of a cross-sectional area of each through-hole of the plurality of through-holes in the lower surface is the same as each other, and the size of a volume inside each through-hole of the plurality of through-holes increases from a center of the showerhead toward an edge thereof,
- wherein each through-hole comprises a conical section terminating at the lower surface.
A substrate processing apparatus comprising:
- a reaction chamber;
- a substrate support positioned in the reaction chamber;
- and
- a showerhead positioned above the substrate support for supplying a gas to a reaction space that is formed between the substrate support and the showerhead,
- wherein the showerhead comprises:
- a showerhead body having an upper surface and a lower surface opposite to the upper surface;
- and
- a plurality of through-holes formed in the showerhead body so that the gas passes through from the upper surface toward the lower surface, wherein
- a size of a cross-sectional area of each through-hole of the plurality of through-holes in the lower surface is the same as each other, while the size of the cross-sectional area of each through-hole in the upper surface increases from a center of the showerhead toward an edge thereof, and
- a cross-sectional dimension of each through-hole in an external region decreases linearly from the upper surface to the lower surface thereof.
Dependencies are inferred from the claim text.