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US 12,224,198 B2Granted
Electrostatic chuck with mesas
AssigneeApplied Materials, Inc.
InventorsVijay D. Parkhe, Ashutosh Agarwal
Life of this patent
Estimating the term…
Abstract
Electrostatic chucks (ESCs) for plasma processing chambers, and methods of fabricating ESCs, are described. In an example, a substrate support assembly includes a ceramic top plate having a top surface with a processing region. One or more electrodes is within the ceramic top plate. A plurality of mesas is within the processing region and on the top surface of the ceramic plate or vertically over an edge of one of the one or more electrodes.
Claims18
A substrate support assembly, comprising:
- a ceramic top plate having a top surface with a processing region;
- one or more electrodes within the ceramic top plate;
- and
- a plurality of mesas within the processing region and on the top surface of the ceramic top plate, wherein all of the plurality of mesas are fully over a corresponding one of the one or more electrodes.
1 more element
A substrate support assembly, comprising:
- a ceramic top plate having a top surface with a processing region;
- a molybdenum mesh within the ceramic top plate;
- and
- a plurality of mesas within the processing region and on the top surface of the ceramic top plate, wherein all of the plurality of mesas are fully over the molybdenum mesh.
1 more element
A substrate support assembly, comprising:
- a ceramic top plate having a top surface with a processing region, the top surface having one or more high topography regions and one or more electrodes within the ceramic top plate;
- and
- a plurality of mesas within the processing region and on the top surface of the ceramic top plate, wherein all of the plurality of mesas are fully over a corresponding one of the one or more electrodes.
A substrate support assembly, comprising:
- a ceramic top plate having a top surface with a processing region, the top surface having one or more stress regions;
- one or more electrodes within the ceramic top plate;
- and
- a plurality of mesas within the processing region and on the top surface of the ceramic top plate, wherein all of the plurality of mesas are fully over a corresponding one of the one or more electrodes.
1 more element
Dependencies are inferred from the claim text.