Electrostatic chuck device and sleeve for electrostatic chuck device
AssigneeTomoegawa Co., Ltd.
InventorNobuyoshi Yamazaki
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AssigneeTomoegawa Co., Ltd.
InventorNobuyoshi Yamazaki
Estimating the term…
An electrostatic chuck device containing a substrate, a stack stacked on an upper surface of the substrate in the thickness direction, and a ceramic layer stacked on an upper surface of the stack in the thickness direction. A sleeve formed from an insulating material is inserted into a through-hole that penetrates through the substrate and the stack in the thickness direction. The upper surface of the sleeve in the thickness direction has a two-level structure including a first upper surface positioned on the same plane as an upper surface of the substrate in the thickness direction, and a second upper surface positioned above the first upper surface in the thickness direction of the sleeve and disposed proximate to the ceramic layer. In a plan view, an edge portion of the stack is disposed on top of the first upper surface.
An electrostatic chuck device comprising:
Dependencies are inferred from the claim text.