Method for performing optical proximity correction and method of manufacturing a mask using optical proximity correction

A method for performing optical proximity correction (OPC) comprising:

• extracting edges for a layout of a pattern on a mask;
• extracting edge pairs among the edges for the layout of the pattern on the mask itself according to a criterion equal to or less than a certain criterion;
• generating a coupling edge for each of the edge pairs;
• generating a first mask image by applying an edge filter to the edges;
• and
• correcting the first mask image by applying a coupling filter to the coupling edge;
• and
• generating a final mask image by adding a second mask image obtained by a thin mask approximation to the first mask image,
• wherein the edge filter corresponds to a first difference image obtained by subtracting a thin mask image obtained through a thin mask approximation from a rigorous mask image obtained through an electromagnetic field simulation in an edge portion of a pattern comprising the edge pairs, and
• wherein the coupling filter corresponds to a second difference image obtained by subtracting the first difference image and the thin mask image from the rigorous mask image for the mask pattern.