Overlay measurement device and method, and system and program therefor

An overlay measurement system, comprising:

• a user terminal generating data that comprise information on a recipe which is input through a manager program, and unique information on an overlay measurement device, and transmitting the generated data to an overlay measurement device corresponding to the unique information, and
• the overlay measurement device analyzing a recipe included in the data that are received from the user terminal, and performing optimization of measurement options of a wafer, based on the recipe, after the recipe is analyzed,
• wherein the overlay measurement device measures an error between a first overlay mark and a second overlay mark respectively formed on different layers of a wafer,
• wherein the overlay measurement device comprises a light source, a beam splitter that splits a beam from the light source into two beams, a spectrum filter for adjusting a central wavelength and a bandwidth of the beam split by the beam splitter to obtain the first overlay mark image or the second overlay mark image, a detector for obtaining the first overlay mark image or the second overlay mark image,
• wherein the overlay measurement device is configured to:
• measure the spectrum filter once with a filter wheel to calculate statistical values in relation to a plurality of parameters for each filter on the filter wheel, and
• assign weights respectively to the calculated statistical values, and perform a filter optimization process selecting a filter having a minimum sum of the statistical values to which the weights is assigned respectively, as the spectral spectrum filter.

A method of an overlay measurement device for measuring an error between a first overlay mark and a second overlay mark respectively formed on different layers of a wafer, the method comprising:

• receiving data from a user terminal, the data comprising information indicating whether to execute the optimization of measurement options of a wafer;
• analyzing a recipe that is included in the data;
• and
• when analyzing the recipe is completed and the data includes information indicating an execution of the optimization, performing optimization of measurement options of a wafer, based on the recipe,
• wherein the overlay measurement device comprises a light source, a beam splitter that splits a beam from the light source into two beams, a spectrum filter for adjusting a central wavelength and a bandwidth of the beam split by the beam splitter to obtain the first overlay mark image or the second overlay mark image, a detector for obtaining the first overlay mark image or the second overlay mark image, and
• wherein the optimization comprises:
• measuring the spectrum filter once with a filter wheel to calculate statistical values in relation to a plurality of parameters for each filter on the filter wheel, and
• assigning weights respectively to the calculated statistical values, and perform a filter optimization process selecting a filter having a minimum sum of the statistical values to which the weights is assigned respectively, as the spectrum filter.