Method for forming structure of pellicle-mask structure with vent structure
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorYun-Yue Lin
Life of this patent
Estimating the term…
Abstract
A method for forming a structure of a pellicle-mask structure is provided. The method includes bonding a pellicle frame to a mask through a pellicle frame adhesive. The method also includes forming a vent structure in the pellicle frame. The method further includes bonding a pellicle membrane to the pellicle frame through a pellicle membrane adhesive. A first size of the pellicle membrane adhesive is greater than a second size of the pellicle frame adhesive.
Claims20
A method for forming a pellicle-mask structure, comprising:
- bonding a pellicle frame to a mask through a pellicle frame adhesive;
- forming a vent structure in the pellicle frame;
- and
- bonding a pellicle membrane to the pellicle frame through a pellicle membrane adhesive, wherein a first size of the pellicle membrane adhesive is greater than a second size of the pellicle frame adhesive.
A method for forming a pellicle-mask structure, comprising:
- disposing a pellicle frame over a mask substrate;
- forming a vent structure in the pellicle frame, wherein the vent structure has a plurality of sub-ventilation holes exposing a suspended section of a bottom surface of the pellicle frame, wherein a bottommost surface of the vent structure is substantially aligned with a bottommost surface of the pellicle frame;
- and
- disposing a pellicle membrane over the pellicle frame.
A method for forming a pellicle-mask structure, comprising:
- forming a mask pattern on a mask substrate;
- bonding a pellicle frame to the mask pattern through a pellicle frame adhesive, wherein an inside surface of the pellicle frame and an outside surface of the pellicle frame opposite to each other and a bottom surface of the pellicle frame connecting the inside surface of the pellicle frame and the outside surface of the pellicle frame;
- forming an opening in the pellicle frame to expose the outside surface of the pellicle frame and the bottom surface of the pellicle frame, wherein the bottom surface of the pellicle frame, an inner sidewall of the pellicle frame adhesive and a top surface of the mask pattern enclose a space;
- disposing a vent structure into the opening;
- and
- disposing a pellicle membrane over the pellicle frame.
Dependencies are inferred from the claim text.