Method and apparatus for removing a particle from a photolithographic mask

An apparatus for removing a particle from a photolithographic mask, comprising:

• a. a manipulator, which is movable relative to the mask and which is movable into the vicinity of the particle to be removed;
• and
• b. a deposition apparatus, which is embodied to deposit a connecting material on the manipulator and/or on the particle from a vapor phase in order to connect the manipulator to the particle, wherein the deposition apparatus is further embodied to provide through the manipulator a particle beam that induces the deposition, wherein the deposition apparatus comprises a gas supply system configured to supply at least one precursor gas, wherein the at least one precursor gas when induced by the particle beam is configured to facilitate deposition of the connecting material.