Control device, control method, lithographic apparatus, method of manufacturing article, and storage medium

A control method of performing position control of a control target by imparting a feedforward operation amount to the control target, the control method comprising:

• determining whether or not a target time for continuing the control using the feedforward operation amount exceeds a predetermined time, and
• correcting the feedforward operation amount to be damped toward an end of the target time in a case where it is determined that the target time has exceeded the predetermined time.

A lithographic apparatus for performing position control of a stage by imparting a feedforward operation amount to a stage having a substrate or a stage having a mask, comprising:

• at least one processor or circuit configured to function as:
• a determination unit configured to determine whether or not a target time for continuing the control using the feedforward operation amount exceeds a predetermined time, and
• a correction unit configured to correct the feedforward operation amount to be damped toward an end of the target time in a case where it is determined by the determination unit that the target time has exceeded the predetermined time.

A non-transitory computer-readable storage medium that stores a computer program to perform position control of a control target by imparting a feedforward operation amount to the control target,

• wherein the computer program comprises instructions for executing a control method comprising:
• determining whether or not a target time for continuing the control using the feedforward operation amount exceeds a predetermined time, and
• correcting the feedforward operation amount to be damped toward an end of the target time in a case where it is determined that the target time has exceeded the predetermined time.