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US 11,112,699 B2Granted
Substrate having film type pattern and the manufacturing method for making the same
OwnerMing-An Hsuinventor
Life of this patent
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Abstract
A substrate having film type pattern and the manufacturing method, the substrate having film type pattern includes: a substrate; at least film type pattern layer which is allocated on the substrate; and a peripheral pattern layer which is allocated around the film type pattern layer.
Claims12
A substrate having a film pattern, comprising:
- a 3-dimensional substrate including a first section having a first height, a second section having a second height that is different from the first height, and a dimensional part connecting the first section and the second section;
- a photoresist pattern layer including a first pattern section formed on the first section of the 3-dimensional substrate and a second pattern section formed on the second section of the 3-dimensional substrate;
- and
- at least a film pattern layer formed only on the dimensional part of the 3-dimensional substrate, the film pattern layer contacting the first pattern section and the second pattern section of the photoresist pattern layer, wherein
- a top surface of the first pattern section and a top surface of the second pattern section of the photoresist pattern layer are free from the film pattern layer, and
- the film pattern layer is a structure independent from the first pattern section and the second pattern section and attached to a side surface of the first pattern section and a side surface of the second pattern section.
3 more elements
Dependencies are inferred from the claim text.