Porous showerhead for a processing chamber
AssigneeApplied Materials, Inc.
InventorsSumit Agarwal, Chad Peterson, Marc Shull
Life of this patent
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Abstract
A showerhead assembly includes a support structure and a porous plate. The support structure includes a support feature. The porous plate has a thermal conductivity of at least about 50 W/(mK) and includes a plurality of pores having an average diameter of less than about 100 um, wherein at least a portion of a perimeter of the porous plate rests on the support feature. The showerhead may be included within a processing chamber that is utilized to process a substrate.
Claims20
A showerhead assembly for a processing chamber, the showerhead assembly comprising:
- a support structure comprising a support feature;
- and a porous plate having a thermal conductivity of at least 50 W/(mK) and comprising a plurality of pores having an average diameter of less than about 100 μm, wherein at least a portion of an edge of the porous plate rests on the support feature.
A processing chamber comprising:
- a substrate support configured to support a substrate;
- a showerhead assembly configured to flow a gas into an interior portion of the processing chamber, the showerhead assembly comprising:
- a support structure comprising a support feature;
- and a porous plate having a thermal conductivity of at least 50 W/(mK) and comprising a plurality of pores having a diameter of less than about 100 μm, wherein at least a portion of an edge of the porous plate rests on the support feature;
- and a gas supply source configured to provide a process gas to the showerhead assembly.
A porous plate for a showerhead assembly of a processing chamber, the porous plate comprising:
- a plurality of pores arranged according to an irregular pattern;
- and a plurality of continuous paths formed from the plurality of pores, wherein each of the plurality of continuous paths extend from a first surface of the porous plate to a second surface of the porous plate, wherein the porous plate has a thermal conductivity of at least 50 W/(mK).
Dependencies are inferred from the claim text.