Detection apparatus, exposure apparatus, and article manufacturing method

An exposure apparatus for exposing a substrate, the exposure apparatus comprising:

• a stage configured to support the substrate and a reference member including a reference mark, and change a position and an orientation of the substrate and the reference member;
• a plurality of detectors arranged apart from each other and configured to detect different marks of a plurality of marks arranged on the substrate supported by the stage;
• and
• a controller configured to control the stage and the plurality of detectors, wherein the controller:
• for each of a plurality of predetermined combinations of the detectors selected from the plurality of detectors, inclines the reference member supported by the stage at an inclination according to information on a position of a detection region and a focal position of each detector, and controls the stage to align the reference mark with each of the plurality of detectors;
• obtains a measurement offset value of each of the plurality of detectors based on measurement values, of the plurality of detectors, each acquired by aligning the reference mark for each of the plurality of predetermined combinations;
• and
• controls positioning of the substrate based on detection results of the plurality of marks on the substrate supported by the stage that are obtained by the controller.

An article manufacturing method comprising:

• exposing a substrate using an exposure apparatus comprising:
• a stage configured to support the substrate and a reference member including a reference mark, and change a position and an orientation of the substrate and the reference member;
• a plurality of detectors arranged apart from each other and configured to detect different marks of the plurality of marks arranged on the substrate supported by the stage;
• and
• a controller configured to control the stage and the plurality of detectors, wherein the controller:
• for each of a plurality of predetermined combinations of the detectors selected from the plurality of detectors, inclines the reference member supported by the stage at an inclination according to information on a position of a detection region and a focal position of each detector, and controls the stage to align the reference mark with each of the plurality of detectors;
• obtains a measurement offset value of each of the plurality of detectors based on measurement values, of the plurality of detectors, each acquired by aligning the reference mark for each of the plurality of predetermined combinations;
• and
• controls positioning of the substrate based on detection results of the plurality of marks on the substrate supported by the stage that are obtained by the controller;
• and
• developing the exposed substrate,
• wherein an article is manufactured from the developed substrate.

A detection apparatus for detecting a plurality of marks arranged on a substrate, the detection apparatus comprising:

• a stage configured to support the substrate and change a position and an orientation of the substrate;
• a plurality of detectors arranged apart from each other and configured to detect different marks of the plurality of marks arranged on the substrate supported by the stage;
• and
• a controller configured to control the stage and the plurality of detectors, wherein the controller:
• for each of a plurality of predetermined combinations of the detectors selected from the plurality of detectors, inclines the substrate supported by the stage at an inclination according to information on a position of a detection region and a focal position of each detector, and controls the stage to align a predetermined mark of the plurality of marks with each of the plurality of detectors;
• and
• obtains a measurement offset value of each of the plurality of detectors based on measurement values, of the plurality of detectors, each acquired by aligning the predetermined mark for each of the plurality of predetermined combinations.

An exposure apparatus for exposing a substrate, the exposure apparatus comprising:

• a stage configured to support the substrate and change a position and an orientation of the substrate;
• a plurality of detectors arranged apart from each other and configured to detect different marks of the plurality of marks arranged on the substrate supported by the stage;
• and
• a controller configured to control the stage and the plurality of detectors, wherein the controller:
• for each of a plurality of predetermined combinations of the detectors selected from the plurality of detectors, inclines the substrate supported by the stage at an inclination according to information on a position of a detection region and a focal position of each detector, and controls the stage to align a predetermined mark of the plurality of marks with each of the plurality of detectors;
• obtains a measurement offset value of each of the plurality of detectors based on measurement values, of the plurality of detectors, each acquired by aligning the predetermined mark for each of the plurality of predetermined combinations;
• and
• controls positioning of the substrate based on detection results of the plurality of marks on the substrate supported by the stage that are obtained by the plurality of detectors.

An article manufacturing method comprising:

• exposing a substrate using an exposure apparatus comprising:
• a stage configured to support the substrate and change a position and an orientation of the substrate;
• a plurality of detectors arranged apart from each other and configured to detect different marks of the plurality of marks arranged on the substrate supported by the stage;
• and
• a controller configured to control the stage and the plurality of detectors, wherein the controller:
• for each of a plurality of predetermined combinations of the detectors selected from the plurality of detectors, inclines the substrate supported by the stage at an inclination according to information on a position of a detection region and a focal position of each detector, and controls the stage to align a predetermined mark of the plurality of marks with each of the plurality of detectors;
• obtains a measurement offset value of each of the plurality of detectors based on measurement values, of the plurality of detectors, each acquired by aligning the predetermined mark for each of the plurality of predetermined combinations;
• and
• controls positioning of the substrate based on detection results of the plurality of marks on the substrate supported by the stage that are obtained by the plurality of detectors;
• and
• developing the exposed substrate,
• wherein an article is manufactured from the developed substrate.

A detection apparatus for detecting a mark, the detection apparatus comprising:

• a stage configured to support an object and change a position and an orientation of the object;
• a plurality of detectors arranged apart from each other and configured to detect different marks of a plurality of marks arranged on the object supported by the stage;
• and
• a controller configured to control the stage and the plurality of detectors, wherein the controller:
• for each of a plurality of predetermined combinations of the detectors selected from the plurality of detectors, inclines the object supported by the stage at an inclination according to information on a position of a detection region and a focal position of each detector, and controls the stage to align a predetermined mark of the plurality of marks with each of the plurality of detectors;
• and
• obtains a measurement offset value of each of the plurality of detectors based on measurement values, of the plurality of detectors, each acquired by aligning the predetermined mark for each of the plurality of predetermined combinations.

An exposure apparatus for exposing a substrate, the exposure apparatus comprising:

• a stage configured to support an object and change a position and an orientation of the object;
• a plurality of detectors arranged apart from each other and configured to detect different marks of a plurality of marks arranged on the object supported by the stage;
• and
• a controller configured to control the stage and the plurality of detectors, wherein the controller:
• for each of a plurality of predetermined combinations of the detectors selected from the plurality of detectors, inclines the object supported by the stage at an inclination according to information on a position of a detection region and a focal position of each detector, and controls the stage to align a predetermined mark of the plurality of marks with each of the plurality of detectors;
• obtains a measurement offset value of each of the plurality of detectors based on measurement values, of the plurality of detectors, each acquired by aligning the predetermined mark for each of the plurality of predetermined combinations;
• and
• controls positioning of the substrate based on detection results of the plurality of marks on the object supported by the stage that are obtained by the plurality of detectors.

An article manufacturing method comprising:

• exposing a substrate using an exposure apparatus comprising:
• a stage configured to support an object and change a position and an orientation of the object;
• a plurality of detectors arranged apart from each other and configured to detect different marks of a plurality of marks arranged on the object supported by the stage;
• and
• a controller configured to control the stage and the plurality of detectors, wherein the controller:
• for each of a plurality of predetermined combinations of the detectors selected from the plurality of detectors, inclines the object supported by the stage at an inclination according to information on a position of a detection region and a focal position of each detector, and controls the stage to align a predetermined mark of the plurality of marks with each of the plurality of detectors;
• obtains a measurement offset value of each of the plurality of detectors based on measurement values, of the plurality of detectors, each acquired by aligning the predetermined mark for each of the plurality of predetermined combinations;
• and
• controls positioning of the substrate based on detection results of the plurality of marks on the object supported by the stage that are obtained by the plurality of detectors;
• and
• developing the exposed substrate,
• wherein an article is manufactured from the developed substrate.