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AssigneeASML Netherlands B.V.
InventorsThomas Poiesz, Bert Dirk Scholten, Dirk Willem Harberts, Lucas Henricus Johannes Stevens, Laura Maria Fernandez Diaz, Johannes Adrianus Cornelis Maria Pijnenburg, Abraham Alexander Soethoudt, Wilhelmus Jacobus Johannes Welters, Jimmy Matheus Wilhelmus Van De Winkel
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A substrate table for an immersion system having a projection system arranged to project an image onto a substrate and a liquid confinement system configured to confine an immersion liquid to a space between the projection system and the substrate, the substrate table including: a substrate holder configured to hold a substrate; and a current control device arranged to reduce an electric current flowing between the substrate and the substrate holder while the immersion liquid is confined to the space.
A substrate table for an immersion system comprising a projection system arranged to project an image onto a substrate and a liquid confinement system configured to confine an immersion liquid to a space between the projection system and the substrate, the substrate table comprising:
A device manufacturing method comprising using a lithographic apparatus having a projection system to project an image onto a substrate held on a substrate holder, the method comprising:
Dependencies are inferred from the claim text.