Lithographic apparatus, cover for use in a lithographic apparatus and method for designing a cover for use in a lithographic apparatus

A substrate table for a lithographic apparatus, the substrate table comprising:

• a support surface configured to receive a substrate;
• and
• a body located at an edge of the support surface, the body having an upper surface with a peripheral boundary and comprising a structure configured to disrupt an immersion fluid film, or its formation, between a part of the body and immersion fluid contained by a fluid handling member of the lithographic apparatus during movement of the substrate table relative to the fluid handling member, wherein the fluid handling member is configured to contain the immersion fluid in a space adjacent to the substrate table and/or adjacent to the substrate when received by the support surface, wherein the structure comprises a surface profile formed on the upper surface, the surface profile comprising (a) a plurality of troughs, each trough having a surface of the structure at its bottom, or (b) a plurality of protrusions, or (c) both (a) and (b).

A substrate table for a lithographic apparatus, the substrate table comprising:

• a support surface configured to hold a substrate having a peripheral edge;
• and
• a ring body having an inner peripheral edge conforming in shape with the peripheral edge of the substrate, the body having an upwardly-facing surface comprising a structure configured to disrupt an immersion fluid film, or its formation, between a part of the body and the immersion fluid contained by a fluid handling member of the lithographic apparatus during movement of the substrate table relative to the fluid handling member, wherein the fluid handling member is configured to contain the immersion fluid in a space adjacent to the substrate table and/or adjacent to the substrate when located on the support surface and wherein at least part of the upper surface of the body at the structure is lyophobic.