Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsHelmar Van Santen, Aleksey Yurievich Kolesnychenko
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Abstract
A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the barrier member and the substrate.
Claims20
A liquid handling system for a lithographic apparatus, the lithographic apparatus comprising a substrate table configured to hold a substrate and a projection system configured to project a patterned beam onto a target portion of the substrate, the liquid handling system comprising:
- a barrier member arranged to extend along at least a part of a boundary of a space between the substrate table and the projection system, the barrier member comprising:
- one or more liquid supply openings configured to provide liquid to the space, the one or more liquid openings arranged to face toward the substrate table and located on opposite sides of a path of the beam through the space;
- and
- a lower horizontal surface below the one or more liquid supply openings, the lower horizontal surface arranged to face toward the substrate table.
A liquid handling system for a lithographic apparatus, the lithographic apparatus comprising a substrate table configured to hold a substrate and a projection system configured to project a patterned beam onto a target portion of the substrate, the liquid handling system comprising:
- a barrier member arranged to extend along at least a part of a boundary of a space between the substrate table and the projection system, the barrier member comprising:
- one or more liquid supply openings configured to provide liquid to the space, the one or more liquid supply openings located on opposite sides of a path of the beam through the space;
- and
- a lower horizontal surface below the one or more liquid supply openings, the lower horizontal surface arranged to be substantially parallel to an upper surface of the substrate table and the one or more liquid openings having a cross-section substantially parallel to lower horizontal surface.
A liquid handling system for a lithographic apparatus, the lithographic apparatus comprising a substrate table configured to hold a substrate and a projection system configured to project a patterned beam onto a target portion of the substrate, the liquid handling system comprising:
- a barrier member arranged to extend along at least a part of a boundary of a space between the substrate table and the projection system, the barrier member comprising:
- one or more liquid supply openings configured to provide liquid to the space, the one or more liquid supply openings surrounding a path of the beam through the space and having one or more cross-sections arranged to be substantially parallel to an upper surface of the substrate when located on the substrate table;
- and
- a lower horizontal surface below the one or more liquid supply openings, the lower horizontal surface arranged to be substantially parallel to the upper surface of the substrate when located on the substrate table.
Dependencies are inferred from the claim text.