Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsMartinus Hendrikus Antonius Leenders, Nicolaas Rudolf Kemper, Joost Jeroen Ottens
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Abstract
An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between that part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased.
Claims20
A liquid handling system for a lithographic apparatus having a movable table and a projection system configured to project a radiation beam onto a substrate, the liquid handling system comprising:
- a barrier member configured to be located adjacent the projection system to at least partly constrain liquid in a space between the projection system and the table, the barrier member comprising an extraction opening in a surface arranged to face toward the table, the extraction opening configured to remove liquid;
- and
- a structure configured to be movable with respect to the barrier member and the table and having an aperture to allow the radiation beam to pass from the projection system to the substrate, the structure located or locatable underneath the extraction opening and having a bottom surface arranged to be located higher than a top surface of the table when the table is positioned underneath the projection system.
A liquid handling system for a lithographic apparatus having a movable table and a projection system configured to project a radiation beam onto a substrate, the liquid handling system comprising:
- a barrier member configured to be located adjacent the projection system to at least partly constrain liquid in a space between the projection system and the table, the barrier member comprising an extraction opening configured to remove liquid;
- and
- a structure configured to be movable with respect to the barrier member and the table, the structure located or locatable underneath a lower surface of the barrier member and arranged to allow liquid from the space to horizontally flow between the structure and the lower surface of the barrier member and to allow the radiation beam to pass an edge of the structure toward the substrate when the structure is located below the lower surface of the barrier member and at the same time has a bottom surface thereof located higher than a top surface of the table when the table is positioned underneath the projection system.
A liquid handling system for a lithographic apparatus having a movable table and a projection system configured to project a radiation beam onto a substrate, the liquid handling system comprising:
- a barrier member configured to be located adjacent the projection system to at least partly constrain liquid in a space between the projection system and the table, the barrier member comprising an extraction opening configured to remove liquid;
- and
- a structure configured to be horizontally movable with respect to the barrier member and the table, the structure arranged so that liquid from the space can enter into between an upper surface of the structure and a lower surface of the barrier member and so that the radiation beam can pass an edge of the structure toward the substrate when the structure has its upper surface located underneath the lower surface of the barrier and has at the same time a bottom surface located higher than a top surface of the table when the table is positioned underneath the projection system.
Dependencies are inferred from the claim text.