Electrostatic chuck assembly having a dielectric filler

An electrostatic chuck assembly, comprising:

• a support member including an electrostatic chuck on an insulator, and wherein the electrostatic chuck includes a chuck sidewall;
• a ground shield extending around the support member, wherein the ground shield is electrically grounded, and wherein the ground shield includes a shield sidewall facing the chuck sidewall;
• and
• a dielectric filler between the chuck sidewall and the shield sidewall, wherein the dielectric filler includes a flexible outer surface attached to the chuck sidewall, and wherein the dielectric filler covers an interface between the electrostatic chuck and the insulator.

A processing system, comprising:

• a process chamber having a chamber wall around a chamber volume;
• a support member within the chamber volume, wherein the support member includes an electrostatic chuck on an insulator, wherein the electrostatic chuck includes a chuck sidewall, and wherein the insulator includes an insulator sidewall;
• a ground shield extending around the support member, wherein the ground shield is electrically grounded, and wherein the ground shield includes a shield sidewall facing the chuck sidewall and the insulator sidewall;
• and
• a dielectric filler between the chuck sidewall, the insulator sidewall, and the shield sidewall, wherein the dielectric filler includes a flexible outer surface covering an interface between the chuck sidewall and the insulator sidewall, and wherein the dielectric filler covers an interface between the electrostatic chuck and the insulator.