Lithographic apparatus and device manufacturing method

A method of manufacturing a device, the method comprising the steps of:

• providing a base frame onto which a stage assembly and a projection system are mounted, the base frame comprising a first portion configured to support the stage assembly and a second portion configured to support the projection system, the first portion and the second portion being connected to each other via a compliant portion of the base frame, the compliant portion being configured to enable a displacement of the first portion relative to the second portion in a vertical direction or about a horizontal axis, the projection system being configured to project a patterned radiation beam onto a target portion of a substrate and the a stage assembly comprising a substrate table constructed to hold the substrate and a positioning device configured to displace the substrate table relative to the projection system;
• placing the substrate on the substrate table;
• displacing the substrate table with the substrate to a position where the projection system is capable of illuminating the substrate;
• and
• projecting the patterned radiation beam onto a target portion of the substrate.

A lithographic apparatus comprising:

• an illumination system configured to condition a radiation beam;
• a support constructed to support a patterning device, the patterning device being capable of imparting a pattern to a cross section of the radiation beam to form a patterned radiation beam;
• a projection system configured to project the patterned radiation beam onto a target portion of a substrate,
• a stage assembly comprising:
• a substrate table constructed to hold the substrate;
• and
• a positioning device configured to displace the substrate table relative to the projection system;
• a base frame onto which the stage assembly and the projection system are mounted;
• the base frame comprising a first portion configured to support the stage assembly and a second portion configured to support the projection system, the first portion and the second portion being connected to each other via a compliant portion of the base frame, the illumination system being mounted to the second portion of the base frame.

A lithographic apparatus comprising:

• an illumination system configured to condition a radiation beam;
• a support constructed to support a patterning device, the patterning device being capable of imparting a pattern to a cross section of the radiation beam to form a patterned radiation beam;
• a projection system configured to project the patterned radiation beam onto a target portion of a substrate,
• a stage assembly comprising:
• a substrate table constructed to hold the substrate;
• and
• a positioning device configured to displace the substrate table relative to the projection system;
• a base frame onto which the stage assembly and the projection system are mounted;
• the base frame comprising a first portion configured to support the stage assembly and a second portion configured to support the projection system, the first portion and the second portion being connected to each other via a compliant portion of the base frame, the base frame being mounted to a pedestal with the first portion of the base frame being mounted to a first portion of the pedestal and the second portion of the base frame being mounted to a second portion of the pedestal.