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US 10,503,083 B2Granted
Apparatus and method for using scanning light beam for film or surface modification
AssigneeLithoptek LLC
InventorsMark Schattenburg, Rudolf Hendel, John Glenn
Life of this patent
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Abstract
A method and apparatus for treating a substrate and, in particular, making secondary adjustments to the results of a primary process applied to the substrate, leading to improved uniformity of the overall process, in which a substrate is positioned on a substrate holder; a scanning a beam of light is directed onto the surface of the substrate; and the amplitude of the scanned beam is varied by location based on a substrate signature.
Claims40
An apparatus for treating a substrate patterned by a primary process, comprising:
- a laser capable of emitting a beam;
- a beam deflector capable of scanning the beam emitted by the laser across the surface of the substrate, before or after the primary process;
- a beam power or energy control driver;
- a substrate signature correction map containing beam power or energy control information and beam position information for a plurality of positions in the substrate;
- a controller, wherein the controller is configured to output a control signal based on the beam power or energy control information in the substrate signature correction map to the beam power or energy control driver and configured to output the beam position information in the substrate signature correction map to the beam deflector, which in turn scans the beam across the surface of the substrate, causing secondary changes in the substrate as the beam is scanned across the surface.
2 more elements
A method of treating a substrate patterned by a primary process comprising:
- scanning a beam of light across a surface of the substrate, before or after the primary process;
- varying an amplitude of said light beam by location as it is scanned across the surface based on a substrate signature correction map containing beam power or energy control information and beam position information for a plurality of positions in the substrate;
- and
- wherein said light beam interacts with the substrate causing secondary changes in the substrate based on the amplitude of said light beam as said light beam is scanned across the surface.
1 more element
Dependencies are inferred from the claim text.